H. A. Huggins

发表

Vacuum ultraviolet rare gas excimer light source

Andreas Ulrich, W. L. Brown, Daniel E. Murnick, 1997 .

Alignment and registration schemes for projection electron lithography

Reginald C. Farrow, James Alexander Liddle, Steven D. Berger, 1991 .

Preparation and properties of Nb Josephson junctions with thin Al layers

J. Rowell, H. Huggins, M. Gurvitch, 1983 .

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

David L. Windt, Myrtle I. Blakey, Warren K. Waskiewicz, 1995 .

Marks for alignment and registration in projection electron lithography

R. G. Tarascon, Reginald C. Farrow, James Alexander Liddle, 1993 .

Projection electron-beam lithography: A new approach

Reginald C. Farrow, James Alexander Liddle, Steven D. Berger, 1991 .

Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique

James Alexander Liddle, Steven D. Berger, Gary R. Weber, 1991 .

Preliminary results from a prototype projection electron‐beam stepper‐scattering with angular limitation projection electron beam lithography proof‐of‐concept system

David L. Windt, Myrtle I. Blakey, Lloyd R. Harriott, 1996 .

High quality refractory Josephson tunnel junctions utilizing thin aluminum layers

H. Huggins, M. Gurvitch, M. Washington, 1983 .