D. J. Mikalsen

A three-layer resist system for deep U.V. and RIE microlithography on nonplanar surfaces

E. Bassous, G. Pepper, Ernest Bassous, 1983 .

Measurement of thermal stress and stress relaxation in confined metal lines. I: Stresses during thermal cycling

Robert Rosenberg, P. S. Ho, Jerome J. Cuomo, 1993 .

Superconducting thin films of the Bi–Sr–Ca–Cu–O system prepared by multilayer metal deposition

S. Shivashankar, J. Cuomo, R. A. Roy, 1988 .

Measurement of thermal stress and stress relaxation in confined metal lines. II. Stress relaxation study

P. Ho, J. Cuomo, M. Moske, 1993 .

Collimated magnetron sputter deposition

Jerome J. Cuomo, Stephen M. Rossnagel, H. Kinoshita, 1991 .

Stress and phase changes in a low-thermal-expansion Al-3at.%Ge alloy film on oxidized silicon wafers

K. Tu, K. Rodbell, D. J. Mikalsen, 1993 .

Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation

J. Cuomo, D. J. Mikalsen, K. Ahn, 1985 .