Patrick R. Justison

Electromigration critical length effect in Cu/oxide dual-damascene interconnects

Paul S. Ho, Ennis T. Ogawa, Hideki Matsuhashi, 2001 .

Direct observation of a critical length effect in dual-damascene Cu/oxide interconnects

Paul S. Ho, Ennis T. Ogawa, Mark R. Breen, 2001 .

Direct observation of a critical length effect in dual-damascene Cu interconnects

Paul S. Ho, Ennis T. Ogawa, Ki-Don Lee, 2000 .

Statistics of electromigration early failures in Cu/oxide dual-damascene interconnects

Paul S. Ho, Ennis T. Ogawa, Ki-Don Lee, 2001, 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167).

Electromigration in multilevel interconnects with polymeric low-k interlevel dielectrics

Hisao Kawasaki, Paul S. Ho, C. Capasso, 2001 .

Electromigration Reliability of Dual-Damascene Cu/Oxide Interconnects

Paul S. Ho, Ennis T. Ogawa, Ki-Don Lee, 2000 .

Electromigration in multi-level interconnects with polymeric low-k interlevel dielectrics

Hisao Kawasaki, Paul S. Ho, C. Capasso, 2000, Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407).