Alexander A. Schafgans

Performance optimization of MOPA pre-pulse LPP light source

Hans Meiling, Igor V. Fomenkov, Wayne J. Dunstan, 2015, Advanced Lithography.

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W

Igor V. Fomenkov, Georgiy O. Vaschenko, Chirag Rajyaguru, 2018, Photomask Technology.

Laser produced plasma EUV sources for device development and HVM

Bruno M. La Fontaine, Imtiaz Ahmad, Michael J. Lercel, 2012, Advanced Lithography.

CO2/Sn LPP EUV sources for device development and HVM

Imtiaz Ahmad, Igor V. Fomenkov, Alex I. Ershov, 2013, Advanced Lithography.

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Igor V. Fomenkov, Alex I. Ershov, Chirag Rajyaguru, 2018, Advanced Lithography.