C. Ellenwood

Impact of test-structure design and test methods for electromigration testing

J. Fazekas, S. Menon, L. Head, 1999, 1999 IEEE International Integrated Reliability Workshop Final Report (Cat. No. 99TH8460).

Test structures for referencing electrical linewidth measurements to silicon lattice parameters using HRTEM

L. W. Linholm, C. E. Murabito, W. Guthrie, 2002, Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002..

A novel method for fabricating CD reference materials with 100 nm linewidths

M. W. Cresswell, R. A. Allen, Loren W. Linholm, 2000, ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095).