Nobuhiro Hata

发表

Self-assembled ultra-low-k porous silica films for 45-nm technology node

Takamaro Kikkawa, Kazuo Kohmura, Akira Ishikawa, 2005, SPIE Optics East.

Progress in deposited refractive index engineered materials and devices

Wayne A. Anderson, Nobuhiro Hata, C. M. Fortmann, 2002, Optics + Photonics.

Prospects of amorphous-silicon-based photonic networks

Nobuhiro Hata, Enrique L. Jaen, C. M. Fortmann, 2000, SPIE Optics + Photonics.

High-speed light-induced photo refractive change in hydrogenated amorphous silicon

Nobuhiro Hata, C. M. Fortmann, 2002, SPIE Optics + Photonics.

Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics

Takamaro Kikkawa, Takahiro Nakayama, Hirofumi Tanaka, 2005, SPIE Optics East.

Photorefractive nanocrystalline silicon: materials, science, and application

Wayne A. Anderson, Nobuhiro Hata, Ronald J. Tonucci, 2002, SPIE/COS Photonics Asia.

Comparative Studies of Ultra Low-κ Porous Silica Films with 2-D Hexagonal and Disordered Pore Structures

Takamaro Kikkawa, Yoshiaki Oku, Nobutoshi Fujii, 2004 .

Advanced characterization of ultra-low-k periodic porous silica films – pore size distribution, pore-diameter anisotropy, and size and macroscopic isotropy of domain structure

Takamaro Kikkawa, Yoshiaki Oku, Nobuhiro Hata, 2003 .

ANNEALING STUDIES ON LOW OPTICAL ABSORPTION OF GD a-Si:H USING PHOTOACOUSTIC SPECTROSCOPY

Nobuhiro Hata, Hideyo Okushi, Satoshi Yamasaki, 1981 .

Effects of Surfactants on the Properties of Ordered Periodic Porous Silica Films

Takamaro Kikkawa, Yoshiaki Oku, Nobuhiro Hata, 2003 .

Effect of TEOS treatment on the properties of periodic nanoporous silica low-k film

Takamaro Kikkawa, Shunsuke Tanaka, Yoshiaki Oku, 2002 .