R. K. Nurani

发表

Role of in-line process monitoring and control in wafer fab management

R. K. Nurani, 1995 .

Comprehensive cost-effective photo defect monitoring strategy

D. Gudmundsson, R. K. Nurani, I. Peterson, 2001, 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203).

The impact of lot-to-lot and wafer-to-wafer variations on SPC

R. K. Nurani, J. G. Shanthikumar, 1997, 1997 2nd International Workshop on Statistical Metrology.

Challenging the paradigm of monitor reduction to achieve lower product costs

Sridhar Seshadri, D. Gudmundsson, R. K. Nurani, 1999, 10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295).

Effective defect management strategies for emerging fab needs

R. K. Nurani, 2001, 2001 6th International Workshop on Statistical Methodology (Cat. No.01TH8550).

Cost effective reticle quality management strategies in wafer fabs

D. Gudmundsson, R. K. Nurani, J. G. Shanthikumar, 1999, 10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295).

Effects of defect propagation/growth on in-line defect based yield prediction

Andrzej J. Strojwas, R. K. Nurani, W. Shindo, 1997, 1997 2nd International Workshop on Statistical Metrology.

Development of cost effective sampling strategy for in-line monitoring

R. K. Nurani, J. G. Shanthikumar, W. Tomlinson, 1997, 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings.

The impact of lot-to-lot and wafer-to-wafer variations on SPC

R. K. Nurani, J. G. Shanthikumar, 1997, 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023).

Role of in-line defect sampling methodology in yield management

Ram Akella, R. K. Nurani, R. Wallace, 1995, Proceedings of International Symposium on Semiconductor Manufacturing.

Effects of defect propagation/growth on in-line defect based yield prediction

Andrzej J. Strojwas, R. K. Nurani, W. Shindo, 1997, 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings.

In-line defect sampling methodology in yield management: an integrated framework

Ram Akella, R. K. Nurani, A. J. Strojwas, 1996 .

Fabless-foundry partnership: models and analysis of coordination issues

Sridhar Seshadri, D. Gudmundsson, R. K. Nurani, 1999 .

Fabless-foundry partnerships: research on coordination issues

Sridhar Seshadri, R. K. Nurani, J. G. Shanthikumar, 1997, 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings.

Critical dimension sample planning for sub-0.25 micron processes

Richard C. Elliott, D. Gudmundsson, R. K. Nurani, 1999, 10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295).

Key considerations in the development of defect sampling methodologies

R. K. Nurani, M. McIntyre, Ram Akella, 1996, IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings.

Sampling plan optimization for detection of lithography and etch CD process excursions

Richard C. Elliott, Sung Jin Lee, R. K. Nurani, 2000, Advanced Lithography.

In-line yield prediction methodologies using patterned wafer inspection information

Andrzej J. Strojwas, Wojciech Maly, R. K. Nurani, 1998 .

Role of yield management in fabless-foundry partnerships

Sridhar Seshadri, R. K. Nurani, J. G. Shanthikumar, 1997, 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023).