Ronald A. Della Guardia

Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 2: RIE-based pattern transfer and completion of dual damascene process yielding an electrically functional via chain

Steven J. Holmes, Nicolette Fender, Dave Horak, 2010, Advanced Lithography.

Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 1: lithographic patterning

Steven J. Holmes, Nicolette Fender, Matthew E. Colburn, 2010, Advanced Lithography.