Diederik Depla

发表

Sputter-deposited Mg–Al–O thin films: linking molecular dynamics simulations to experiments

Annemie Bogaerts, Violeta Georgieva, D. Depla, 2009 .

Understanding the discharge voltage behavior during reactive sputtering of oxides

Johan Haemers, D. Depla, R. D. Gryse, 2007 .

Computer modelling of magnetron discharges

Annemie Bogaerts, G. Buyle, Ivan Kolev, 2009 .

Reactive Sputter Deposition

D. Depla, S. Mahieu, Diederik Depla, 2008 .

Towards a more complete model for reactive magnetron sputtering

D. Depla, S. Mahieu, Diederik Depla, 2007 .

High rate reactive magnetron sputter deposition of titanium oxide

Sören Berg, Tomas Kubart, Tomas Nyberg, 2008 .

Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)

Guy Marin, Roger De Gryse, Hilde Poelman, 2004 .

A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

Koen Strijckmans, Sören Berg, Tomas Nyberg, 2013 .

Dynamic Monte Carlo simulation for reactive sputtering of aluminium

Annemie Bogaerts, Z. Y. Chen, D. Depla, 2003 .

Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model

Annemie Bogaerts, D. Depla, A. Bogaerts, 2009 .

Modeling of the target surface modification by reactive ion implantation during magnetron sputtering

Renaat Gijbels, Annemie Bogaerts, Z. Y. Chen, 2004 .

Influence of the target composition on reactively sputtered titanium oxide films

Jens Jensen, Sören Berg, Tomas Kubart, 2009 .

The importance of an external circuit in a particle-in-cell/Monte Carlo collisions model for a direct current planar magnetron

Annemie Bogaerts, Ivan Kolev, I. Kolev, 2008 .

Thirty years of rotatable magnetrons

Wouter Leroy, Johan Haemers, Diederik Depla, 2012 .

Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation

G. Buyle, Jan Musschoot, Johan Haemers, 2006 .