Toshikuni Shinohara

Highly-reliable, low-resistivity bcc-Ta gate MOS technology using low-damage Xe-plasma sputtering and Si-encapsulated silicidation process

Tadahiro Ohmi, T. Ushiki, Kazuhide Ino, 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).