I. Jauberteau

发表

Nitrogen ion beam-assisted pulsed laser deposition of boron nitride films

A. Catherinot, B. Angleraud, M. Cahoreau, 1998 .

Investigations on a nitriding process of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma

P. Goudeau, M. Cahoreau, I. Jauberteau, 2009 .

Langmuir probe in magnetized plasma: Study of the diffusion parameter

O. Cortázar, I. Jauberteau, J. Jauberteau, 2021, Contributions to Plasma Physics.

Langmuir Probe in Non‐Maxwellian Plasma: Correlation Between the Electron Energy Distribution Function, the Ion Energy at the Sheath Edge and the Floating Voltage

I. Jauberteau, J. Jauberteau, 2014 .

Plasma parameters deduced from cylindrical probe measurements: determination of the electron density at the ion saturation current

I. Jauberteau, J. Jauberteau, 2008 .

Synthesis of cyanides in N2–CH4 discharge afterglow

I. Jauberteau, J. Jauberteau, 2018, Journal of Physics D: Applied Physics.

Langmuir probe in magnetized plasma: Determination of the electron diffusion parameter and of the electron energy distribution function

O. Cortázar, I. Jauberteau, J. Jauberteau, 2019, Contributions to Plasma Physics.

Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2

O. Cortázar, I. Jauberteau, J. Jauberteau, 2016 .

NH3 and NHx<3 radicals synthesis downstream a microwave discharge sustained in an Ar-N2-H2 gas mixture. Study of surface reactive processes and determination of rate constants

I. Jauberteau, J. Aubreton, J. Jauberteau, 2002 .

SrBi2Nb2O9 Ferroelectric Powders and Thin Films Prepared by Sol-Gel

J. Mercurio, J. H. Yi, I. Jauberteau, 1998 .

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

A. Bessaudou, R. Mayet, I. Jauberteau, 2015 .

Determination of the electron energy distribution function in the plasma by means of numerical simulations of multiple harmonic components on a Langmuir probe characteristic—measurements in expanding microwave plasma

I. Jauberteau, J. Jauberteau, 2007 .

Plasma chemistry and diagnostic in an Ar–N2–H2 microwave expanding plasma used for nitriding treatments

I. Jauberteau, J. Aubreton, J. Jauberteau, 2010 .

A reduction–nitridation process of molybdenum films in expanding microwave plasma: Crystal structure of molybdenum nitrides

A. Bessaudou, R. Mayet, I. Jauberteau, 2015 .

Comparison of hexamethyldisiloxane dissociation processes in plasma.

I. Jauberteau, J. Jauberteau, 2012, The journal of physical chemistry. A.

Hydrogen Balmer line broadening in Ar-N2-SiH4 DC glow discharge

I. Jauberteau, J. Jauberteau, 2022, Journal of Applied Physics.

High Reactivity of CH2 Radical in an AR–CH4 Post-Discharge

L. Thomas, A. Catherinot, L. Thomas, 1998 .

Microwave Plasma Carburizing

I. Jauberteau, J. Jauberteau, 2016 .

Absolute electron-impact ionization cross sections of free radicals from threshold to 30eV: CHx=2,3, Si(CH3)x=1,2,3, and H2Si(CH3) radicals

I. Jauberteau, J. Aubreton, J. Jauberteau, 2006 .

Argon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement

I. Jauberteau, J. Aubreton, J. Jauberteau, 2004 .

Reaction rate constant for Ar(P2) metastable atoms with the tetramethylsilane molecule

I. Jauberteau, J. Aubreton, J. Jauberteau, 2000 .

Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity

M. J. Cinelli, M. Cahoreau, I. Jauberteau, 2000 .

Characterization of an Ar-TMS microwave discharge using mass spectrometry: effect of the reactor design on free-radical contents

I. Jauberteau, J. Aubreton, J. Jauberteau, 1999 .

Ti nitrides and Ti silicides simultaneous growth in thin Ti films

I. Jauberteau, 2020 .

Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

A. Bessaudou, R. Mayet, I. Jauberteau, 2018, AIP Advances.

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

D. Mangin, A. Bessaudou, R. Mayet, 2017 .

Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films

D. Mangin, A. Bessaudou, R. Mayet, 2019, Coatings.

Atomic force microscopy investigations on nanoindentation impressions of some metals: effect of piling-up on hardness measurements

M. Nadal, I. Jauberteau, J. Jauberteau, 2008 .

A Thermochemical Process Using Expanding Plasma for Nitriding Thin Molybdenum Films at Low Temperature

A. Bessaudou, I. Jauberteau, T. Merle-Méjean, 2012 .

Expanding microwave plasma process for thin molybdenum films nitriding: Nitrogen diffusion and structure investigations

A. Bessaudou, I. Jauberteau, J. Aubreton, 2011 .

Surface reactivity of molybdenum thin films exposed to (Ar–N2–H2) expanding microwave plasma at low temperature: influence of the addition of H2 gas in the plasma

M. Cahoreau, I. Jauberteau, J. Aubreton, 2005 .

Reactivity of methane in a nitrogen discharge afterglow

M. J. Cinelli, I. Jauberteau, J. Aubreton, 2002 .

Plasma nitriding of thin molybdenum layers at low temperature

M. Semeria, I. Jauberteau, J. Aubreton, 1999 .

Characterization of an argon-hydrogen microwave discharge used as an atomic hydrogen source. Effect of hydrogen dilution on the atomic hydrogen production

L. Thomas, A. Catherinot, L. Thomas, 1997 .

Electrostatic probe measurements in an expanding microwave discharge sustained in an Ar–N2–H2 gas mixture: Investigation on plasma parameters

I. Jauberteau, J. Aubreton, J. Jauberteau, 2004 .

Electrostatic waves in plasma: the case of an expanding microwave plasma sustained in argon

I. Jauberteau, J. Jauberteau, 2014 .

Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay

O. Cortázar, I. Jauberteau, J. Jauberteau, 2017 .

Designing Resonance Microwave Cavities to Optimize Plasma Generation

Osvaldo Daniel Cortázar, A. Megía-Macías, Elena Barrios-Diaz, 2020, IEEE Transactions on Instrumentation and Measurement.

Effect of the electron energy distribution function in plasma on the Bohm criterion and on the drop voltage through the sheath: Case of microwave expanding plasma

I. Jauberteau, J. Jauberteau, 2009 .

Comments on the Bohm Criterion and on the Determination of the Ion Velocity at the Sheath Edge in Non‐Maxwellian Plasma

I. Jauberteau, J. Jauberteau, 2011 .

Floating double probe in non‐Maxwellian plasmas: Determination of the electron density and mean electron energy

I. Jauberteau, J. Jauberteau, 2018 .

Determination of the electron density in plasma by means of a floating double probe.

I. Jauberteau, J. Jauberteau, 2008, The Review of scientific instruments.

Electron energy distribution function in plasma determined using numerical simulations of multiple harmonic components on Langmuir probe characteristic: efficiency of the method.

I. Jauberteau, J. Jauberteau, 2007, The Review of scientific instruments.

Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow

I. Jauberteau, J. Aubreton, J. Jauberteau, 2000 .

Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations

I. Jauberteau, J. Aubreton, J. Jauberteau, 2007 .

Intermediate species in a 2.45 GHz microwave plasma sustained in an argon–tetramethylsilane gas mixture

I. Jauberteau, J. Aubreton, J. Jauberteau, 2003 .

Initial stages in the growth of carbon films produced in an Ar–CH4–H2 microwave discharge: Composition and surface layers morphology

M. J. Cinelli, L. Thomas, A. Catherinot, 1996 .

Dielectric properties in microwave remote plasma sustained in argon: Expanding plasma conditions

I. Jauberteau, J. Jauberteau, 2012 .

A spatially resolved plasma diagnostic in an expanding microwave discharge containing an Ar- gas mixture: uniformity and stability of the discharge

M. J. Cinelli, I. Jauberteau, J. Aubreton, 1999 .