J. J. Bucchignano

Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications

Marie Angelopoulos, Karen Petrillo, David R. Medeiros, 2002, Photomask Technology.

An ultra-low power 0.1 /spl mu/m CMOS

Yuan Taur, J. J. Bucchignano, Shalom J. Wind, 1994, Proceedings of 1994 VLSI Technology Symposium.

Studies of acid diffusion in low Ea chemically amplified photoresists

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2005, SPIE Advanced Lithography.

High performance 0.1 /spl mu/m CMOS devices with 1.5 V power supply

Yuan Taur, Keith A. Jenkins, P. J. Coane, 1993, Proceedings of IEEE International Electron Devices Meeting.

Graphene radio frequency devices on flexible substrate

Keith A. Jenkins, Wenjuan Zhu, Phaedon Avouris, 2013 .

Effective Schottky Barrier lowering for contact resistivity reduction using silicides as diffusion sources

P. M. Solomon, J. J. Bucchignano, J. Bruley, 2010, Proceedings of 2010 International Symposium on VLSI Technology, System and Application.

Lithography and fabrication processes for sub‐100 nm scale complementary metal–oxide semiconductor

Yuan Taur, J. J. Bucchignano, Shalom J. Wind, 1995 .

Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography

Richard Martel, J. J. Bucchignano, Josef Michl, 2002 .

Submicron electron‐beam lithography using a beam size comparable to the linewidth control tolerance

F. J. Hohn, J. J. Bucchignano, W. W. Molzen, 1987 .

Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly

Sebastian Engelmann, Joy Cheng, Michael A. Guillorn, 2012 .

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2004 .