Robert Lang
发表
Marie Angelopoulos,
Karen Petrillo,
David R. Medeiros,
2002,
Photomask Technology.
Marie Angelopoulos,
David R. Medeiros,
Arpan P. Mahorowala,
2001,
Photomask Japan.
Marie Angelopoulos,
Karen Petrillo,
David R. Medeiros,
2001,
SPIE Advanced Lithography.
Robert Lang,
R. Lang,
2002
.
Hiroshi Ito,
Martha I. Sanchez,
Gregory M. Wallraff,
2003,
SPIE Advanced Lithography.
Marie Angelopoulos,
Karen Petrillo,
Wenjie Li,
2002,
SPIE Photomask Technology.
Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists
Marie Angelopoulos,
Karen Petrillo,
Qinghuang Lin,
2002,
SPIE Advanced Lithography.
Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
Scott Halle,
Marie Angelopoulos,
Karen Petrillo,
2003,
SPIE Advanced Lithography.
Marie Angelopoulos,
David R. Medeiros,
Wu-Song Huang,
1999
.