Jimmy Hu

发表

A comprehensive look at a new metrology technique to support the needs of lithography performance in near future

Maurits van der Schaar, Kaustuve Bhattacharyya, Jacky Huang, 2008, Lithography Asia.

Correlation of a Sinusoidal Sweep Test To Field Random Vibration

Jimmy Hu, 2005 .

A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy

Noelle Wright, Kaustuve Bhattacharyya, Jacky Huang, 2009, Advanced Lithography.

Temperature Spectrums of an Automotive Environment for Fatigue Reliability Analysis

Jimmy Hu, Ken Salisbury, 2006 .

Sub-nanometer pitch calibration and data quality evaluation methodology

Burn Jeng Lin, Jacky Huang, Chih-Ming Ke, 2008, SPIE Advanced Lithography.

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Noelle Wright, Maurits van der Schaar, Kaustuve Bhattacharyya, 2009, Advanced Lithography.

Printability of buried mask defects in extreme UV lithography

Shu-Hao Chang, Anthony Yen, Jimmy Hu, 2011, Advanced Lithography.

Overlay similarity: a new overlay index for metrology tool and scanner overlay fingerprint methodology

Anthony Yen, Chih-Ming Ke, Chen-Yu Chang, 2009, Advanced Lithography.

Life Prediction and Damage Acceleration Based on the Power Spectral Density of Random Vibration

Jimmy Hu, 2005 .

On the extensibility of extreme UV lithography

Anthony Yen, Jimmy Hu, Timothy Wu, 2011, Advanced Lithography.

The role resist plays in EUVL extensibility

Anthony Yen, Jimmy Hu, Timothy Wu, 2012, Advanced Lithography.