H. L. Chung

A comprehensive look at a new metrology technique to support the needs of lithography performance in near future

Maurits van der Schaar, Kaustuve Bhattacharyya, Jacky Huang, 2008, Lithography Asia.

A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy

Noelle Wright, Kaustuve Bhattacharyya, Jacky Huang, 2009, Advanced Lithography.

Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

Noelle Wright, Maurits van der Schaar, Kaustuve Bhattacharyya, 2009, Advanced Lithography.

A sophisticated metrology solution for advanced lithography: addressing the most stringent needs of today as well as future lithography

Noelle Wright, Maurits van der Schaar, Sophia Wang, 2009, Lithography Asia.