Efrain Altamirano-Sanchez

Line edge and width roughness smoothing by plasma treatment

Stefan De Gendt, Peter De Schepper, Terje Hansen, 2014 .

Challenges in using optical lithography for the building of a 22nm node 6T-SRAM cell

Naoto Horiguchi, Anabela Veloso, S. Locorotondo, 2010 .

A Low-Power HKMG CMOS Platform Compatible With Dram Node 2× and Beyond

Naoto Horiguchi, Wilfried Vandervorst, Tom Schram, 2014, IEEE Transactions on Electron Devices.

Formation of a Nanoscale SiO2 Capping Layer on Photoresist Lines with an Ar/SiCl4/O2 Inductively Coupled Plasma: A Modeling Investigation

Efrain Altamirano-Sanchez, Annemie Bogaerts, Peter De Schepper, 2014 .

Dry Etch Fin Patterning of a Sub-22nm Node SRAM Cell: EUV Lithography New Dry Etch Challenges

Naoto Horiguchi, Werner Boullart, Efrain Altamirano-Sanchez, 2011 .