Alessandro Vaglio Pret

发表

Line edge and width roughness smoothing by plasma treatment

Stefan De Gendt, Peter De Schepper, Terje Hansen, 2014 .

Modelling and Experimental Evaluation of (Post)Lithography Process Contributions to Pattern Roughness (Modellering en experimentele evaluatie van (post)-lithografie procesbijdragen aan patroon ruwheid)

Alessandro Vaglio Pret, 2012 .

Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

Evangelos Gogolides, Vassilios Constantoudis, Roel Gronheid, 2013 .

Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations

Evangelos Gogolides, Vassilios Constantoudis, Hari Pathangi, 2016, SPIE Advanced Lithography.

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Evangelos Gogolides, Vassilios Constantoudis, Hari Pathangi, 2017 .

Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories

Diederik Verkest, Wim Dehaene, Miguel Corbalan, 2012, Microelectron. Reliab..

Stochastic side-lobe printing in EUV lithography: a simulation study

Stewart A. Robertson, Alessandro Vaglio Pret, Anatoly Burov, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes

Philippe Foubert, Roel Gronheid, Alessandro Vaglio Pret, 2010 .

Impact of pupil plane filtering on mask roughness transfer

Bruce W. Smith, Joost Bekaert, Chris Maloney, 2013 .

Mask Effects on Resist Variability in Extreme Ultraviolet Lithography

John J. Biafore, Pei-Yang Yan, Roel Gronheid, 2013 .

Evidence of speckle in extreme-UV lithography.

Pei-Yang Yan, Roel Gronheid, Alessandro Vaglio Pret, 2012, Optics express.

A Physics-based Model for Negative Tone Development Materials

John J. Biafore, Stewart A. Robertson, Alessandro Vaglio Pret, 2014 .

Effect of PAG distribution on ArF and EUV resist performance

Roel Gronheid, Kathleen Nafus, Shinichi Hatakeyama, 2009 .

Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for extreme ultraviolet lithography

Roel Gronheid, Toru Ishimoto, Kohei Sekiguchi, 2010 .

Mask absorber roughness impact in extreme ultraviolet lithography

Trey Graves, John J. Biafore, Roel Gronheid, 2011 .

Line Width Roughness mitigation in chemically amplified resist by post-litho processes

Roel Gronheid, Alessandro Vaglio Pret, 2010 .

Mask line roughness contribution in EUV lithography

Roel Gronheid, Alessandro Vaglio Pret, 2011 .

Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result

Philippe Foubert, Roel Gronheid, Alessandro Vaglio Pret, 2011 .

Stochastic limitations for EUV resist kinetics towards the 16nm node

John J. Biafore, Roel Gronheid, Alessandro Vaglio Pret, 2011 .