Gurwan Kerrien

Characterization of inverse SRAF for active layer trenches on 45-nm node

Jean-Damien Chapon, Jérôme Belledent, Christophe Couderc, 2007, Photomask Japan.

Illumination conditions matching for critical layers manufacturing in a production context

Gurwan Kerrien, Andreas Torsy, Louis-Pierre Armellin, 2006, SPIE Advanced Lithography.

Laser doping for microelectronics and microtechnology

Tarik Bourouina, Kuniyuki Kakushima, Elisabeth Dufour-Gergam, 2004, SPIE High-Power Laser Ablation.

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

Jérôme Belledent, Christophe Couderc, Isabelle Schanen, 2007, SPIE Photomask Technology.

Impact of modelisation pixel size on OPC consistency

Vincent Farys, Gurwan Kerrien, Catherine Martinelli, 2009, Advanced Lithography.

32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner

Will Conley, Jérôme Belledent, Christophe Couderc, 2007, SPIE Advanced Lithography.

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

Jérôme Belledent, Christophe Couderc, Frank Sundermann, 2007, European Mask and Lithography Conference.