Laurent LeCam

Characterization of inverse SRAF for active layer trenches on 45-nm node

Jean-Damien Chapon, Jérôme Belledent, Christophe Couderc, 2007, Photomask Japan.

Sensitivity of a variable threshold model toward process and modeling parameters

Kevin Lucas, Jérôme Belledent, Christophe Couderc, 2006, SPIE Photomask Technology.

3D mask modeling with oblique incidence and mask corner rounding effects for the 32nm node

Jérôme Belledent, Christophe Couderc, Isabelle Schanen, 2007, SPIE Photomask Technology.

OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes

Jérôme Belledent, Christophe Couderc, Frank Sundermann, 2007, European Mask and Lithography Conference.