S. R. Mohanty

A fast capillary discharge plasma dedicated to EUV radiation production-possible source for EUV lithography

Eric Robert, Christophe Cachoncinlle, C. Fleurier, 2002, Conference Record of the Twenty-Fifth International Power Modulator Symposium, 2002 and 2002 High-Voltage Workshop..

Capillary discharge sources of hard UV radiation

Eric Robert, Remi Dussart, Christophe Cachoncinlle, 2002 .

Optical Emission Spectroscopy to study FeCo thin film deposition using plasma focus

Paul Choon Keat Lee, T. L. Tan, Stuart Victor Springham, 2005 .

A novel fast capillary discharge system emitting intense EUV radiation: possible source for EUV lithography

Eric Robert, Remi Dussart, Christophe Cachoncinlle, 2003 .

Recent progress in EUV source development at GREMI

Eric Robert, Remi Dussart, Christophe Cachoncinlle, 2002 .

Anode length optimization in a modified plasma focus device for optimal x-ray yields

Eiki Hotta, S. Mohanty, E. Hotta, 2006 .