M. Vos

发表

Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

R. Synowicki, W. Kessels, H. Knoops, 2017 .

Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma

W. Kessels, H. Knoops, M. Vos, 2021, The journal of physical chemistry. C, Nanomaterials and interfaces.

Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3

W. Kessels, H. Knoops, T. Faraz, 2020, Applied Physics Letters.

Concepts and prospects of passivating contacts for crystalline silicon solar cells

W. Kessels, W. Kessels, S. Smit, 2015, 2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC).

Plasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?

M. Creatore, W. Kessels, M. Vos, 2020, The Journal of Physical Chemistry C.

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

M. Verheijen, J. Ekerdt, W. Kessels, 2019, Chemistry of Materials.

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

W. Kessels, M. Vos, A. Mackus, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Low‐temperature atomic layer deposition of MoOx for silicon heterojunction solar cells

A. Bol, W. Kessels, B. Macco, 2015 .

Annelations of cyclic Beta-cyanoketones in the synthesis of functionalized polycyclic compounds and steroids

H. Zuilhof, M. Vos, A. Groot, 2005 .

Nucleation behavior of atomic layer deposition of platinum on zinc oxide

M. Vos, 2012 .

Nucleation behavior of atomic layer deposition of platinum on zinc oxide

M. Vos, 2012 .

Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design

J. Ekerdt, W. Kessels, S. Agarwal, 2021 .

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

W. Kessels, M. Vos, A. Mackus, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Atomic layer deposition of molybdenum oxide from ( N t Bu ) 2 ( NMe 2 ) 2 Mo and O 2 plasma

A. Bol, B. Macco, M. Vos, 2015 .

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

M. Vos, A. Mackus, G. van Straaten, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.