A. Mackus

发表

Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

R. Synowicki, W. Kessels, H. Knoops, 2017 .

Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma

W. Kessels, H. Knoops, M. Vos, 2021, The journal of physical chemistry. C, Nanomaterials and interfaces.

Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3

W. Kessels, H. Knoops, T. Faraz, 2020 .

Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review

S. Bent, Jon G. Baker, A. Mackus, 2018, Chemistry of Materials.

Atomic Layer Deposition of Highly Transparent Platinum Counter Electrodes for Metal/Polymer Flexible Dye‐Sensitized Solar Cells

V. Zardetto, T. Brown, F. De Rossi, 2014 .

Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

F. Roozeboom, W. Kessels, A. Mameli, 2017, ACS nano.

Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

S. Bent, A. Bol, W. Kessels, 2017, Chemistry of materials : a publication of the American Chemical Society.

A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.

S. Bent, W. Kim, T. Kaufman-Osborn, 2016, ACS nano.

Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity

M. Verheijen, W. Kessels, T. Faraz, 2020, Chemistry of Materials.

Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers

M. Verheijen, A. Bol, W. Kessels, 2020, ACS materials letters.

From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†

W. Kessels, A. Mackus, M. Merkx, 2018, Chemistry of materials : a publication of the American Chemical Society.

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

M. Verheijen, J. Ekerdt, W. Kessels, 2019, Chemistry of Materials.

Atomic layer deposition of cobalt using H2-, N2-, and NH3-based plasmas

W. Kessels, A. Mackus, G. V. Straaten, 2018 .

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

W. Kessels, M. Vos, A. Mackus, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

W. Kessels, M. Vos, A. Mackus, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Approaches and opportunities for area-selective atomic layer deposition

A. Mackus, 2018, 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA).

Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide.

S. Bent, W. Kim, A. Mackus, 2017, The Journal of chemical physics.

Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis

M. Verheijen, A. Bol, W. Kessels, 2013 .

Foundations of atomic-level plasma processing in nanoelectronics

K. Karahashi, S. Hamaguchi, K. Arts, 2022, Plasma Sources Science and Technology.

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma

F. Roozeboom, M. Verheijen, W. Kessels, 2018, ACS applied materials & interfaces.

Catalytic combustion and dehydrogenation reactions during atomic layer deposition of platinum

W. Kessels, N. Leick, A. Mackus, 2012 .

Area-selective atomic layer deposition of ln 2 O 3 : H using a μ-plasma printer for local area activation

F. Roozeboom, Y. Kuang, M. Creatore, 2017 .

Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2

W. Kessels, D. Hausmann, A. Mackus, 2020 .

Tandem Core-Shell Si-Ta3N5 Photoanodes for Photoelectrochemical Water Splitting.

Christopher Hahn, S. Bent, T. Jaramillo, 2016, Nano letters.

Room-Temperature Atomic Layer Deposition of Platinum

A. Bol, D. Garcia-Alonso, W. Kessels, 2013 .

Dependence of inherent selective atomic layer deposition of FeOx on Pt nanoparticles on the coreactant and temperature

K. Cao, Rong Chen, Jiaming Cai, 2021 .

Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition

M. Verheijen, W. Kessels, C. V. D. Marel, 2012 .

Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation

M. Verheijen, A. Bol, S. Assali, 2016, Nanotechnology.

Nanopatterning by direct-write atomic layer deposition.

W. Kessels, A. Mackus, J. Mulders, 2012, Nanoscale.

Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition

F. Roozeboom, M. Verheijen, W. Kessels, 2019, Chemistry of Materials.

Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition

S. Bent, T. Grehl, H. Brongersma, 2016 .

Precise ion energy control with tailored waveform biasing for atomic scale processing

M. Verheijen, W. V. van Gennip, W. Kessels, 2020, Journal of Applied Physics.

Equivalent electric circuit model of accurate ion energy control with tailored waveform biasing

E. Lemmen, B. Vermulst, A. Mackus, 2022, Plasma Sources Science & Technology.

Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition.

K. Cao, Rong Chen, Yao Jing, 2020, ACS applied materials & interfaces.

Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition.

S. Bent, I. Oh, Hyungjun Kim, 2020, ACS nano.

Resist-free fabricated carbon nanotube field-effect transistors with high-quality atomic-layer-deposited platinum contacts

Zhihong Chen, A. Bol, W. Kessels, 2017 .

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

Jun Yu Li, W. Kessels, P. Lemaire, 2022, The journal of physical chemistry. C, Nanomaterials and interfaces.

Identification of highly active surface iron sites on Ni(OOH) for the oxygen evolution reaction by atomic layer deposition

S. Bent, C. de Paula, A. Mackus, 2020 .

The Role of Aluminum in Promoting Ni–Fe–OOH Electrocatalysts for the Oxygen Evolution Reaction

S. Bent, M. Bajdich, A. Mackus, 2019, ACS Applied Energy Materials.

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

F. Roozeboom, Y. Kuang, M. Creatore, 2017, Chemistry of materials : a publication of the American Chemical Society.

Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design

J. Ekerdt, W. Kessels, S. Agarwal, 2021 .

MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier

J. Maes, M. Verheijen, A. Bol, 2023, Advanced Materials Interfaces.

Graphene devices with bottom-up contacts by area-selective atomic layer deposition

A. Bol, W. Kessels, R. Vervuurt, 2017 .

Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

M. Vos, A. Mackus, G. van Straaten, 2018, The journal of physical chemistry. C, Nanomaterials and interfaces.

Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3

H. Knoops, A. Mackus, Nicholas J. Chittock, 2023, Journal of Applied Physics.

Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide.

S. Bent, W. Kim, A. Mackus, 2017, The Journal of chemical physics.