Rita Mullins

Self-Limiting Temperature Window for Thermal Atomic Layer Etching of HfO2 and ZrO2 Based on the Atomic-Scale Mechanism

M. Nolan, S. Natarajan, S. D. Elliott, 2020 .

Origin of Enhanced Thermal Atomic Layer Etching of Amorphous HfO2

M. Nolan, J. J. Gutiérrez Moreno, Rita Mullins, 2021, Journal of Vacuum Science & Technology A.

Mechanism of the HF Pulse in the Thermal Atomic Layer Etch of HfO2 and ZrO2: A First Principles Study

M. Nolan, S. Natarajan, S. D. Elliott, 2019 .

Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay

M. Nolan, Hongliang Lu, Ji Liu, 2023, The journal of physical chemistry. C, Nanomaterials and interfaces.