Nicholas J. Chittock

Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3

W. Kessels, H. Knoops, T. Faraz, 2020, Applied Physics Letters.

Precise ion energy control with tailored waveform biasing for atomic scale processing

M. Verheijen, W. V. van Gennip, W. Kessels, 2020, Journal of Applied Physics.

Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3

H. Knoops, A. Mackus, Nicholas J. Chittock, 2023, Journal of Applied Physics.