Wei-Yung Hsu

Investigating positive DUV resist profile on TiN

William L. Krisa, Qizhi He, Wei W. Lee, 1997, Advanced Lithography.

A High Productivity and Low Topography W CMP Process Enabled by a Dual Endpoint System and Novel Pad Conditioning

Wei-Yung Hsu, Sen-Hou Ko, J.C. Wang, 2006, 2006 IEEE International Symposium on Semiconductor Manufacturing.

Cu Planarization in Electrochemical Mechanical Planarization

Wei-Yung Hsu, Stan D. Tsai, F. Liu, 2006 .