G. Nicholls

RF System for the Indiana University Cyclotron Facility Cooler Project

G. Nicholls, Xiao Kun Pei, R. L. Poirier, 1987 .

Etching 200-mm diameter SCALPEL masks with the ASE process

Stephen Hall, Gregory R. Bogart, Anthony E. Novembre, 2000, Advanced Lithography.

Computations predicting RF cavity characteristics

G. Nicholls, Y. Jin, 1988 .

Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor

G. Nicholls, Janet Hopkins, Alan Michael Hynes, 1999 .

ADVANCES IN DEEP ANISOTROPIC SILICON ETCH PROCESSING FOR MEMS

G. Nicholls, Janet Hopkins, Alan Michael Hynes, 2000 .