Justin Brockman

Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability

Markus G. Kuhn, Xin Liu, Patrick M. Lenahan, 2016, Microelectron. Reliab..

Substrate-induced disorder in V2O3 thin films grown on annealed c-plane sapphire substrates

Justin Brockman, Mahesh G. Samant, S. Parkin, 2012 .

Valence and conduction band offsets at low-k a-SiOxCy:H/a-SiCxNy:H interfaces

Benjamin French, Justin Brockman, Marc French, 2014 .

Valence and conduction band offsets at amorphous hexagonal boron nitride interfaces with silicon network dielectrics

Anthony N. Caruso, Benjamin French, Justin Brockman, 2014 .

Increased metal-insulator transition temperatures in epitaxial thin films of V2O3 prepared in reduced oxygen environments

Justin Brockman, Teya Topuria, Mahesh G. Samant, 2011 .