Marc French

Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability

Markus G. Kuhn, Xin Liu, Patrick M. Lenahan, 2016, Microelectron. Reliab..

Valence and conduction band offsets at low-k a-SiOxCy:H/a-SiCxNy:H interfaces

Benjamin French, Justin Brockman, Marc French, 2014 .

Valence and conduction band offsets at amorphous hexagonal boron nitride interfaces with silicon network dielectrics

Anthony N. Caruso, Benjamin French, Justin Brockman, 2014 .

Film Property Requirements for Hermetic Low-k a-SiOxCyNz:H Dielectric Barriers

Marc French, Sean W. King, David W. Gidley, 2012 .

X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface

Benjamin French, Marc French, Sean W. King, 2011 .

X-ray photoelectron spectroscopy investigation of the Schottky barrier at low-k a-SiO(C):H/Cu interfaces

Benjamin French, Marc French, Sean W. King, 2011 .