Moh Lung Ling

Radial segmentation approach for contact hole patterning in 193 nm immersion lithography

Cho Jui Tay, Chenggen Quan, Gek Soon Chua, 2010, Advanced Lithography.

Line end shortening and corner rounding for novel off-axis illumination source shapes

Cho Jui Tay, Chenggen Quan, Gek Soon Chua, 2009, Advanced Lithography.

Circular apertures for contact hole patterning in 193-nm immersion lithography

Cho Jui Tay, Chenggen Quan, Gek Soon Chua, 2010, International Conference on Experimental Mechanics.

A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography

Cho Jui Tay, Chenggen Quan, Gek Soon Chua, 2007, SPIE Advanced Lithography.

Customized illumination shapes for 193nm immersion lithography

Cho Jui Tay, Chenggen Quan, Gek Soon Chua, 2008, SPIE Advanced Lithography.