G. Cho

发表

Comparison of dry etching of AlGaAs and InGaP in a planar inductively coupled BCl3 plasma

S. Pearton, J. Lee, W. Lim, 2003 .

Enhancement of Light Guiding Efficiency in CMOS Image Sensor by Introducing an Optical Thin Film

G. Cho, M. Kang, Eun-Mi Ko, 2009 .

Temperature-dependent Cl2/Ar plasma etching of bulk single-crystal ZnO

Eun Seong Lee, S. Pearton, D. Norton, 2003 .

Effect of negative ions on stimulated Raman scattering in a plasma

G. Cho, 1990 .

Stimulated Brillouin backscattering of a circularly polarized pump in a plasma with negative ions

G. Cho, B. Cho, 1988 .

Detuning effect of negative ions on ion-acoustic-decay instabilities of electromagnetic waves

G. Cho, 1998 .

Effect of negative ions on filamentation instability in collisionless three-fluid theory of plasmas with cold ion species

Jae Yong Lee, H. Kong, G. Cho, 1996 .

Detuning effect of negative ions on oscillating‐two‐stream instabilities of electromagnetic waves

Jae Yong Lee, H. Kong, G. Cho, 1996 .

Selective etching of GaAs over Al0.2Ga0.8As semiconductor in pulsed DC BCl3/SF6 plasmas

S. Pearton, J. Lee, D. Park, 2012 .

Comparison of planar inductively coupled plasma etching of GaAs in BCl3, BCl3/Ar, and BCl3/Ne

J. Lee, J. Leem, I. Baek, 2004 .

Planar Inductively Coupled BCl3 Plasma Etching of III-V Semiconductors

S. Pearton, J. Lee, W. Lim, 2004 .

BCl3/Ne etching of III–V semiconductors in a planar inductively coupled plasma reactor

S. Pearton, W. Lim, M. Jeon, 2004 .

Role of inert gas additive on dry etch patterning of InGaP in planar inductively coupled BCl3 plasmas

S. Pearton, J. Lee, W. Lim, 2004 .

Electrical characteristics of Mg-doped GaAs epitaxial layers grown by molecular beam epitaxy

Ho Jin Park, Do Yeob Kim, J. Leem, 2008 .

O2/N2 Plasma Etching of Acrylic in a Multi-layers Electrode RIE System

Hanjung Song, G. Cho, Jewon Lee, 2007 .

Net Positive Normal Force on a Metal Surface from a Grazing Incident p-Polarized Laser Pulse

Y. Tsui, G. Cho, M. Kang, 2007, Conference on Lasers and Electro-Optics.

Post-growth annealing effects of Mg doped GaAs epitaxial layers on microstructural and optical properties.

Ho Jin Park, M. Jeon, Do Yeob Kim, 2009, Journal of Nanoscience and Nanotechnology.

Development of advanced plasma process with an optical emission spectroscopy-based end-point technique for etching of AlGaAs over GaAs in manufacture of heterojunction bipolar transistors

S. Pearton, J. Lee, M. Jeon, 2002 .

Investigation of GaAs Dry Etching in a Planar Inductively Coupled BCl3 Plasma

I. Baek, S. Pearton, J. Lee, 2004 .

Dry Etching of GaAs in a Planar Inductively Coupled BCl 3 Plasma

S. Pearton, K. Cho, W. Lim, 2003 .