D. Durham

Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applications

Ping-Hung Lu, Dinesh N. Khanna, T. Perera, 1992 .

Survey of carbon-13-hydrogen splittings in alkenes

D. Draney, D. Durham, C. Kingsbury, 1977 .

Correction. Survey of Carbon-13-Hydrogen Splittings in Alkenes.

D. Draney, D. Durham, C. Kingsbury, 1976 .

3JCH coupling constants in oxiranes, thiiranes, and cyclopropanes

D. Durham, C. Kingsbury, Ronald F. Hutton, 1978 .

Lithographic performance of a dry-etch stable methacrylate resist at 193 nm

Munirathna Padmanaban, Ralph R. Dammel, Stanley A. Ficner, 1998, Advanced Lithography.

Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 1999, Advanced Lithography.

Stripping and Cleaning for Advanced Photolithography Applications

D. Durham, J. Marsella, Leslie Molnar, 2011 .

The state of water in biological systems as studied by proton and deuterium relaxation.

D. Durham, B M Fung, D L Durham, 1975, Biochimica et biophysica acta.