G. Pfeiffer

Integration of Local Stress Techniques with Strained-Si Directly on Insulator (SSDOI) Substrates

Y.H. Kim, M. Ieong, T. Kanarsky, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFET

M. Vinet, L. Grenouillet, T. Nagumo, 2012, 2012 International Electron Devices Meeting.

High performance cmos bulk technology using direct silicon bond (dsb) mixed crystal orientation substrates

Chun-Yung Sung, Zhijiong Luo, Haizhou Yin, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..