Yukihiro Morimoto

Study of the Outgassing from the ArF CA Resist during ArF (193nm) Exposure

Atsushi Sekiguchi, Fumihiko Oda, Takeshi Matsunobe, 2009 .

Optical absorption properties of TiO2-doped silica glass in UV–VUV region

Kazuaki Yano, Yukihiro Morimoto, Y. Morimoto, 2004 .

Techniques for Measuring Rate Constants for Acid Generation from PAG (Photo Acid Generator) during ArF Exposure

Yoshiyuki Kono, Fumihiko Oda, Yukihiro Morimoto, 2008 .

Analysis of the Generating Action of the Acid from PAG using Acid Sensitive Dyes (2)

Atsushi Sekiguchi, Yoko Matsumoto, Kengo Moriyasu, 2012 .

Disinfection and healing effects of 222-nm UVC light on methicillin-resistant Staphylococcus aureus infection in mouse wounds.

Tianhong Dai, Tatsushi Igarashi, Michael R Hamblin, 2018, Journal of photochemistry and photobiology. B, Biology.

Interstitial oxygen molecules in amorphous SiO2. I. Quantitative concentration analysis by thermal desorption, infrared photoluminescence, and vacuum-ultraviolet optical absorption

Linards Skuja, Hideo Hosono, Masahiro Hirano, 2005 .