Mark Gross

Effect of reactive ion etching–generated sidewall roughness on propagation loss of buried‐channel silica waveguides

M. V. Bazylenko, Mark Gross, M. Faith, 1996 .

Photosensitivity of Ge-doped silica deposited by hollow cathode PECVD

David J. Moss, P. L. Chu, D. Moss, 1996 .

A deterministic optical figure correction technique that preserves precision-polished surface quality.

Jan Burke, Mark Gross, John Arkwright, 2008, Optics express.

Mechanisms of photosensitivity in germanosilica films

David J. Moss, D. Moss, M. Gross, 1997 .

Hollow cathode etching and deposition

K. E. Davies, Mark Gross, Chris M. Horwitz, 1988 .

Ultraviolet laser-induced damage on fused silica substrate and its sol-gel coating.

Jun Shen, Katie Green, B. Oreb, 2012, Optics letters.