Aram Kazarian

New methodologies for lower-K1 EUV OPC and RET optimization

Guangming Xiao, Kevin Lucas, Kevin Hooker, 2017, Advanced Lithography.

ILT optimization of EUV masks for sub-7nm lithography

Guangming Xiao, Kevin Lucas, Kevin Hooker, 2017, European Mask and Lithography Conference.

Calculation of Shear Stability of Conjugation of the Main Pillars with the Foundation in Wooden Frame Buildings

Vladimir Rimshin, Aram Kazarian, Vladimir Morozov, 2018, Advances in Intelligent Systems and Computing.

Resist loss in 3D compact modeling

Jensheng Huang, Xin Zheng, Aram Kazarian, 2012, Advanced Lithography.

A new etch-aware after development inspection (ADI) technique for OPC modeling

Aram Kazarian, Brad Falch, Jason Huang, 2010, Advanced Lithography.

Chemically amplified resist modeling in OPC

Yongfa Fan, Xin Zheng, Jason Huang, 2009, Advanced Lithography.

Resist bias measured in Iso-focal structure

Lawrence S. Melvin, Qiliang Yan, Aram Kazarian, 2008, SPIE Advanced Lithography.

Assist feature printability prediction by 3-D resist profile reconstruction

Xin Zheng, Jensheng Huang, Aram Kazarian, 2012, Other Conferences.

Empirical data validation for model building

Aram Kazarian, 2008, SPIE Advanced Lithography.