S. McCoy

Optimization of diffusion, activation and damage annealing in millisecond annealing

H. Kheyrandish, P. J. Timans, J. Gelpey, 2008, 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors.

Advanced activation of ultra-shallow junctions using flash-assisted RTP

Peter Pichler, J. Gelpey, Silke Paul, 2005 .

Vth variation and strain control of high Ge% thin SiGe channels by millisecond anneal realizing high performance pMOSFET beyond 16nm node

G. Bersuker, R. Jammy, P. Majhi, 2006, 2009 Symposium on VLSI Technology.

Ultra-shallow junction formation using flash annealing and advanced doping techniques

J. Gelpey, A. Kontos, D. Camm, 2008, Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08).