L. B. La

Optimization of Hafnium Zirconate (HfZrOx) Gate Dielectric for Device Performance and Reliability

E. Luckowski, C. Capasso, S. Kalpat, 2006 .

Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO2

B. E. White, M. Ramon, G. Tam, 2004 .

Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments

M. Ramon, Raghaw Rai, Peter Fejes, 2004 .

Compatibility of polycrystalline silicon gate deposition with HfO2 and Al2O3/HfO2 gate dielectrics

Raghaw Rai, Rama I. Hegde, L. Prabhu, 2002 .

Physical and electrical properties of metal gate electrodes on HfO2 gate dielectrics

Bich-Yen Nguyen, Raghaw Rai, M. Zavala, 2003 .

Compatibility of Silicon gates with hafnium-based gate dielectrics

Raghaw Rai, Rama I. Hegde, L. Prabhu, 2003 .