Daisuke Fuchimoto

Weighting evaluation for improving OPC model quality by using advanced SEM-contours from wafer and mask

Hiroyuki Shindo, John L. Sturtevant, Daisuke Hibino, 2012, Advanced Lithography.

SEM-contour shape analysis method for advanced semiconductor devices

Hiroyuki Shindo, Daisuke Hibino, Hideo Sakai, 2013, Advanced Lithography.

SEM-contour shape analysis based on circuit structure for advanced systematic defect inspection

Hiroyuki Shindo, Daisuke Fuchimoto, Yasutaka Toyoda, 2014, Advanced Lithography.

Implementation of templated DSA for via layer patterning at the 7nm node

Geert Vandenberghe, Germain Fenger, Julien Ryckaert, 2015, Advanced Lithography.

Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process

Hiroyuki Shindo, Peter De Bisschop, Toru Ishimoto, 2014, Advanced Lithography.

Measurement technology to quantify 2D pattern shape in sub-2x nm advanced lithography

Hiroyuki Shindo, Jeroen Van de Kerkhove, Peter De Bisschop, 2013, Advanced Lithography.