Sang-Ho Lee

Particle Adhesion and Removal on EUV Mask Layers During Wet Cleaning

Jin-Goo Park, A. Busnaina, Jin-Goo Park, 2004, Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004..

Interfacial and electrokinetic characterization of IPA solutions related to semiconductor wafer drying and cleaning

Ahmed Busnaina, Tae-Gon Kim, Jin-Goo Park, 2006 .

Laser shock removal of nanoparticles from Si capping layer of EUV mask

Young-Jae Kang, Jin-Goo Park, Sang-Ho Lee, 2004, Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004..

The Surface Modification with Fluorocarbon Thin Films for the Prevention of Stiction in Mems

Yong-Kweon Kim, Hyung-jae Shin, Jin-Goo Park, 1998 .

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

Guojing Zhang, Ahmed Busnaina, Florence Eschbach, 2005 .

Nanoscale Particles Removal on an Extreme Ultra-Violet Lithography (EUVL) Mask Layer

Guojing Zhang, Ahmed Busnaina, Florence Eschbach, 2006 .

The Effect of Additives in Post-Cu CMP Cleaning on Particle Adhesion and Removal

Ahmed Busnaina, Tae-Gon Kim, Jin-Goo Park, 2004 .