Pamela Turci

Comparison of particle measurement tools for use with photoresist: film surface versus liquid techniques

Michael Anderson, Susan Bablouzian, Michael Gaudet, 1996, Advanced Lithography.

Highly regioselective PACs for i-line resist design: synthetic reaction model, dissolution kinetics and lithographic response

Pamela Turci, Anthony Zampini, Ashish Pandya, 1994, Advanced Lithography.

Dissolution Rate Modifying Chemistry: Interaction of Base-soluble and Base-insoluble Non-actinic Dyes With Novolak Polymers and Novolak-based Positive Photoresists

Pamela Turci, Michael F. Cronin, Thomas A. Fisher, 1989, Advanced Lithography.

High-resolution positive photoresists: novolac molecular weight and molecular weight distribution effects

Roger F. Sinta, Pamela Turci, Anthony Zampini, 1990, Advanced Lithography.

Profile defects in novolac/DNQ resists: I. formation of microgrooves

Peter Trefonas, Pamela Turci, Michael J. Monaghan, 1995, Advanced Lithography.