Todd R. Hayes

Light scattering methods for semiconductor process monitoring and control

Diane Lambert, Jeffrey A. Gregus, Joseph B. Kruskal, 1992, Other Conferences.

Applications of dry etching to InP-based laser fabrication

Todd R. Hayes, Sung-June Kim, Christian A. Green, 1991, Photonics West - Lasers and Applications in Science and Engineering.

SiO2 mask erosion and sidewall composition during CH4/H2 reactive ion etching of InGaAsP/InP

Todd R. Hayes, P. M. Thomas, P. F. Sciortino, 1993 .

Real‐time latent image monitoring during holographic fabrication of submicron diffraction gratings

Euijoon Yoon, Richard A. Gottscho, Todd R. Hayes, 1993 .

Intrinsic mechanism of smooth and rough morphology in etching of InP by Cl2 determined by infrared laser interferometry

V. M. Donnelly, Todd R. Hayes, M. Vernon, 1992 .

Optical measurement of surface recombination in InGaAs quantum well mesa structures

Todd R. Hayes, Won-Tien Tsang, Samuel L. McCall, 1988 .

Damage to InP and InGaAsP surfaces resulting from CH4/H2 reactive ion etching

Todd R. Hayes, H. S. Luftman, A. B. Emerson, 1990 .