A. Kornblit

发表

Light scattering methods for semiconductor process monitoring and control

Diane Lambert, Jeffrey A. Gregus, Joseph B. Kruskal, 1992, Other Conferences.

NEW ROBUST n+/p+ DUAL-GATE CMOS TECHNOLOGY OPTIMIZED FOR LOW POWER OPERATION

A. Kornblit, H. D. Lin, K. H. Lee, 1994 .

Etching 200-mm diameter SCALPEL masks with the ASE process

Stephen Hall, Gregory R. Bogart, Anthony E. Novembre, 2000, Advanced Lithography.

Myrtle I. Blakey, Reginald C. Farrow, Milton L. Peabody, 1999, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

Overview of SCALPEL mask technology

Myrtle I. Blakey, Reginald C. Farrow, James Alexander Liddle, 1999, European Mask and Lithography Conference.

200-mm SCALPEL mask development

Myrtle I. Blakey, Reginald C. Farrow, Milton L. Peabody, 1999, Advanced Lithography.

Alignment mark detection in CMOS materials with SCALPEL e-beam lithography

Gregg M. Gallatin, Myrtle I. Blakey, Isik C. Kizilyalli, 1999, Advanced Lithography.

Kwok K. Ng, A. Kornblit, Chorng Ping Chang, 1993, Other Conferences.

Linewidth Control In Trilevel Etching

A. Kornblit, Darryl W. Peters, Michael J. Grieco, 1987, Advanced Lithography.

System design for large-scale ion trap quantum information processor

Robert M. Jopson, M. Dinu, A. Kornblit, 2005, Quantum Inf. Comput..

High performance, sub-50nm MOSFETS for mixed signal applications

A. Kornblit, A. Taylor, R. Chan, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

Sub-0.1-μm NMOS transistors fabricated using point-source x-ray lithography

Raymond A. Cirelli, William M. Mansfield, J. Frackoviak, 1995, Advanced Lithography.

Self-aligned silicided inverse-T gate LDD devices for sub-half micron CMOS technology

A. Kornblit, S.J. Hillenius, M.-L. Chen, 1990, International Technical Digest on Electron Devices.

Inverted thin-film transistors with a simple self-aligned lightly doped drain structure

C.-T. Liu, A. Kornblit, C. Liu, 1992 .

Exploring the Prospects for a Nanometer-scale Gene Chip

A. Kornblit, K. Schulten, F. Klemens, 2006, 2006 International Electron Devices Meeting.

50 nm Vertical Replacement-Gate (VRG) pMOSFETs

T. Nigam, James D. Plummer, J. F. Miner, 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

The relentless march of the MOSFET gate oxide thickness to zero

Donald M. Tennant, A. Kornblit, Gregory Timp, 2000 .

Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing

M. V. Malyshev, Vincent M. Donnelly, A. Kornblit, 2002 .

Percent dissociation of Cl2 in inductively coupled, chlorine-containing plasmas

M. V. Malyshev, Vincent M. Donnelly, V. M. Donnelly, 1998 .

Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data

Joseph B. Kruskal, Richard A. Gottscho, A. Kornblit, 1993 .

Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles

David M. Haaland, John R. McNeil, Richard A. Gottscho, 1994 .

Sub-0.1 μm NMOS transistors fabricated using laser-plasma point-source X-ray lithography

A. Kornblit, G.K. Celler, W.M. Mansfield, 1995, IEEE Electron Device Letters.

Flexible fabrication of large pixel count piston-tip-tilt mirror arrays for fast spatial light modulators

J. F. Miner, J. E. Bower, Raymond A. Cirelli, 2007 .

50 nm vertical replacement-gate (VRG) nMOSFETs with ALD HfO/sub 2/ and Al/sub 2/O/sub 3/ gate dielectrics

T. Nigam, A. Kornblit, M.R. Baker, 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

The vertical replacement-gate (VRG) MOSFET

T. Nigam, A. Kornblit, F. P. Klemens, 2002 .

MEMS thermal imager with optical readout

Nagesh R. Basavanhally, J. F. Miner, J. E. Bower, 2009 .

Characterization of Piston-Tip-Tilt mirror pixels for scalable SLM arrays

A. Kornblit, M.R. Baker, R. Ryf, 2006, IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006..