M.S. Abkar

Fabrication of TaN-gated ultra-thin MOSFETs (EOT <1.0 nm) with HfO/sub 2/ using a novel oxygen scavenging process for sub 65 nm application

Changhwan Choi, Chang Yong Kang, Se Jong Rhee, 2005, Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..