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S.A. Krishna
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Fabrication of TaN-gated ultra-thin MOSFETs (EOT <1.0 nm) with HfO/sub 2/ using a novel oxygen scavenging process for sub 65 nm application
Changhwan Choi, Chang Yong Kang, Se Jong Rhee, 2005, Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..