J. Cipo

Diagnostics of process plasma used for the production of memristive devices

H. Kohlstedt, H. Kersten, J. Cipo, 2020, Journal of Physics: Conference Series.

Correlation between sputter deposition parameters andI-Vcharacteristics in double-barrier memristive devices

M. Ziegler, H. Kohlstedt, G. Kothleitner, 2019, Journal of Vacuum Science & Technology B.

Correlation between properties of direct current magnetron sputtered thin niobium nitride films and plasma parameters

H. Kohlstedt, G. Kolhatkar, H. Kersten, 2022, Thin Solid Films.

Energy-dependent film growth of Cu and NiTi from a tilted DC magnetron sputtering source determined by calorimetric probe analysis

D. Meyners, H. Kersten, J. Cipo, 2022, Surface and Coatings Technology.