T. Iwamoto

Overlay and critical dimension control in 100-nm ULSI processes using TaBN x-ray masks and the XRA x-ray stepper

Takao Taguchi, Katsumi Suzuki, Kiyoshi Fujii, 2001, SPIE Advanced Lithography.

High-accuracy resist development process with wide margins by quick removal of reaction products

Tadahiro Ohmi, Masanobu Onodera, Hisayuki Shimada, 1994, Advanced Lithography.

Influence of carbon contamination on ultrathin gate oxide reliability

T. Iwamoto, Tadahiro Ohmi, Toshiki Miyake, 1996, Advanced Lithography.

Suppression of Charges in Al~2O~3 Gate Dielectric and Improvement of MOSFET Performance by Plasma Nitridation

Toru Tatsumi, Satoshi Kamiyama, T. Iwamoto, 2004 .

Recent progress in 1×x-ray mask technology: Feasibility study using ASET-NIST format TaXN x-ray masks with 100 nm rule 4 Gbit dynamic random access memory test patterns

Yuusuke Tanaka, T. Iwamoto, Shinji Tsuboi, 2001 .

High-Performance Cu-Interconnects with Novel Seamless Low-k SiOCH Stacks (SEALS) Featured by Compositional Modulation Process for 45nm-Node ULSI Devices

T. Fukai, T. Takeuchi, T. Iwamoto, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

A 65nm-node LSTP(LOW Standby Power) Poly-Si/a-Si/HfSiON Transistor with High Ion-Istandby Ratio and Reliability

Kiyotaka Imai, Toru Tatsumi, T. Iwamoto, 2004 .

Critical-dimension control for 100 nm patterns in x-ray lithography

T. Iwamoto, M. Fukuda, Y. Tanaka, 1999 .

Effects of Selecting Channel Direction in Improving Performance of Sub-100 nm MOSFETs Fabricated on (110) Surface Si Substrate

Masami Hane, T. Iwamoto, Tatsuya Ezaki, 2004 .

High mobility MISFET with low trapped charge in HfSiO films

T. Iwamoto, A. Morioka, T. Mogami, 2003, 2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407).

55nm CMOS Technology for Low Standby Power/Generic Applications Deploying the Combination of Gate Work Function Control by HfSiON and Stress-Induced Mobility Enhancement

K. Taniguchi, T. Iwamoto, K. Imai, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Capability of 70 nm Pattern Replication in X-Ray Lithography

T. Iwamoto, Y. Matsui, K. Fujii, 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).