Kiyohiko Matsudo

Low-temperature silicon epitaxy by low-energy bias sputtering

Tadahiro Ohmi, Hiroshi Iwabuchi, Takeshi Ichikawa, 1988 .

In situ substrate‐surface cleaning for very low temperature silicon epitaxy by low‐kinetic‐energy particle bombardment

Tadahiro Ohmi, Hiroshi Iwabuchi, Takeshi Ichikawa, 1988 .