Yun-Yu Wang

Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress

Ying Li, Anita Madan, Oleg Gluschenkov, 2008 .

Low Tinv (≤ 1.8 nm) Metal-Gated MOSFETs on SiO2 Based Gate Dielectrics for High Performance Logic Applications

Wilfried Haensch, Ernest Y. Wu, Ying Li, 2003 .

Nanoscale strain distributions in embedded SiGe semiconductor devices revealed by precession electron diffraction and dual lens dark field electron holography

Conal E. Murray, N. Bernier, J. Bruley, 2015 .

Electromigration in aluminum damascene lines

Terence Kane, Ronald G. Filippi, Kenneth P. Rodbell, 1999 .

Quantification of local strain distributions in nanoscale strained SiGe FinFET structures

Akira Sakai, Conal E. Murray, Shotaro Takeuchi, 2017 .