Hakseung Han

EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch

Sungmin Huh, Iacopo Mochi, Stefan Wurm, 2009, European Mask and Lithography Conference.

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Sungmin Huh, Han-Ku Cho, Hoon Kim, 2009, Advanced Lithography.

Improved scatterometry method of critical dimension measurements and its application for control of development process

Donggun Lee, Hakseung Han, Irina Pundaleva, 2006, SPIE Advanced Lithography.