Eiichi Nomura

发表

High-resolution, High-purity Calix[n]arene Electron Beam Resist.

Hiromasa Yamamoto, Takahiro Teshima, Jun-ichi Fujita, 2000 .

Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Calixarene Electron Beam Resist for Nano-Lithography

Toshitsugu Sakamoto, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650

Jun-ichi Fujita, Yukinori Ochiai, Shoko Manako, 1998 .

High-performance membrane mask for electron projection lithography

Hiroshi Nozue, Isao Amemiya, H. Nozue, 2000 .

Relationship between the total energy efficiency of a sodium–sulfur battery system and the heat dissipation of the battery case

R. Okuyama, Eiichi Nomura, E. Nomura, 1999 .

Recent Progress in Electron-Beam Cell Projection Technology

Takahiro Ema, Hiroshi Nozue, Takao Tamura, 1996 .

Nanometer‐scale resolution of calixarene negative resist in electron beam lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1996 .